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Brewer Science发布新型DBARC材料

2010-05-24 14:50
小伊琳
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Brewer Science, Inc., a leading supplier of advanced lithography materials, has released ARC? DS-K101P developer-soluble bottom anti-reflective coating (DBARC). This DBARC product has been formulated to meet the needs of the KrF photolithographer and augments processes where the resist budget is limited.

Building on a strong history of creating DBARCs, Brewer Science has developed a premium version of the successful Brewer Science? ARC? DS-K101 coating. ARC? DS-K101P KrF DBARC is designed to meet the tightening specifications of the 22-nm node and beyond. ARC? DS-K101P material has less than 1 ppb ions, while still maintaining the broad resist compatibly and tunability of the industry-proven ARC? DS-K101 coating. This new premium product will enable existing implant processes to transfer to future nodes.

“Brewer Science’s continuous improvement process supports customers with new leading-edge lithography products,” says Jim Lamb, Managing Director of Product Management at Brewer Science. “ARC? DS-K101P DBARC was created to give customers a valued solution for < 150- nm CD processes for implant, and a viable cost reduction for BEOL layers.”

The tight n and k optical constants of Brewer Science? ARC? DS-K101P coating provide consistent performance, while developer solubility can improve throughput by eliminating an etch step, which reduces the cost of ownership. Call Brewer Science today to learn more.

 

声明: 本文由入驻维科号的作者撰写,观点仅代表作者本人,不代表OFweek立场。如有侵权或其他问题,请联系举报。

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